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Molecular pump GTP-4200

● Suitable for optical coating, vacuum furnace, vacuum sintering, environmental simulation ● Dust containing gas can be removed, and the pumping speed is larger

Detailed description

Commodity name: Molecular pump GTP-4200

● Suitable for optical coating, vacuum furnace, vacuum sintering, environmental simulation ● Dust containing gas can be removed, and the pumping speed is larger

● Suitable for optical coating, vacuum furnace, vacuum sintering, environmental simulation
● Dust containing gas can be removed, and the pumping speed is larger

Technical parameters

Vacuum parameter			Physical parameter
Ultimate pressure（Pa）	<5x10^-6（LF）；<5x10^-7（CF）		Air inlet flange		DN400 ISO-K（LF）orCF
Speed of evacuation（L/S）	N₂	He	Exhaust port flange		DN100 ISO-K（LF）
	4200	3500	Recommended front pump（L/s）		30~70
Compression ratio	>1x10⁸	>8x10³	Weight（kg）		≈100
Controller parameter			Bearing		ceramic ball Bearing
Communication model	RS-485		Installation direction		vertical±5°
Supply voltage (V)	220VAC（±10%）		Operating ambient magnetic field（mT）		≤3mT
Power Frequency (Hz)	50/60Hz±5%
Rated speed（r/min）	15600±0.1%
Environmental conditions	No corrosive gases and obvious dust particles; Environment temperature：-10℃~50℃； environment humidity：≤90%， Vibration value（μm） strength：≤0.5g		Environment temperature	Water -cooling	5~40℃



			Cooling water parameter		flow：≥3L/min

Pumping speed curve

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Beijing Grand Hitek Co.,Ltd

Telephone:+86-10-86229784

E-mail:sales@grandhitek.com.cn

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