Multi-stage Roots vacuum pump GMR
- Detailed description
- Specifications
-
- Commodity name: Multi-stage Roots vacuum pump GMR
● GMR series dry pump, can be used in cleaning process and general harsh process; ● High reliability, very low cost; ● It is mainly suitable for etching and ion implantation process cavity in semiconductor industry. <img src="https://omo-oss-image.thefastimg.com/portal-saas/new2024020415251217007/cms/image/a694d20b-eaca-43ce-abcd-46814a119b13.jpg" style="width: auto; height: auto; max-width:570px;" />
● GMR series dry pump, can be used in cleaning process and general harsh process;
● High reliability, very low cost;
● It is mainly suitable for etching and ion implantation process cavity in semiconductor industry.Dimensions
Model
Length (mm)
Width (mm)
Height (mm)
GMR200
695
290
434
GMR600
695
290
706
GMR1200
695
290
706
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Technical parameters
Model
Maximum pumping speed
(m3/h)Ultimate vacuum
(mbar)Inlet diameter(ISO)
Outlet diameter(NW)
Supply voltage(V)
Rated power(kw)
Operating power
(kw)Cooling water(L/m)
Nitrogen(slm)
Power input
jackWeight
(kg)Noise
dB(A)GMR200
210
0.005
ISO63
NW25
208/380
1.9
0.7
1.9
20~40
HAN 40A
140
<63
GMR600
610
0.005
ISO100
NW25
208/380
3.8
1.1
2.1
20~90
HAN 40A
250
<63
GMR1200
1050
0.005
ISO100
NW25
208/380
3.8
1.3
2.1
20~90
HAN 40A
250
<63
Pumping speed curve

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