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GMR Series Multistage Roots Dry Vacuum Pump
- Detailed description
- Specifications
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- Commodity name: GMR Series Multistage Roots Dry Vacuum Pump
● GMR series dry pumps can be used in clean processes and general demanding processes; High reliability and extremely low operating cost; ● Mainly suitable for etching and ion implantation process chambers in the semiconductor industry; ● Low energy consumption, corrosion resistance, and small footprint.
● GMR series dry pumps can be used in clean processes and general demanding processes; High reliability and extremely low operating cost;
● Mainly suitable for etching and ion implantation process chambers in the semiconductor industry;
● Low energy consumption, corrosion resistance, and small footprint.
Application Challenges and Application Areas
Process Condensation Corrosion Recommended Products Remark IMP source ● GMR Strip/Ashing GMR Oxide Etch ● GMR Poly Etch ● GMR Metal Etch ● ● GMR For 6-inch and 8-inch Fab HDP ● GMR -
Technical Specifications
Model Maximum Pumping Speed Ultimate Pressure Inlet Port Diameter Exhaust Port Diameter Supply Voltage Rated power Operating Power Cooling Water Nitrogen Weight Noise (m3/h) (mbar) (ISO) (NW) (V) (kW) (kW) (L/min) (slm) (kg) dB(A) GMR200 210 <1×10-2 63 25 208/380 1.9 0.7 1.9 20-40 140 <63 GMR600 630 <5×10-3 100 25 208/380 4.8 0.8 2 20-40 203 <63 GMR1200 1100 <5×10-3 100 25 208/380 4.8 1 2 20-40 203 <63 GMR1800 1800 <5×10-3 100 40 208/380 6.5 1.7 3.6 20-90 350 <63 Dimensions
Model Length(mm) Width(mm) Height(mm) GMR200 695 290 434 GMR600 685 275 706 GMR1200 685 275 706 GMR1800 901 390 780 Pumping Speed Curve

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