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Multi-stage Roots vacuum pump GMR

● GMR series dry pump, can be used in cleaning process and general harsh process; ● High reliability, very low cost; ● It is mainly suitable for etching and ion implantation process cavity in semiconductor industry.
  • Detailed description
  • Specifications
    • Commodity name: Multi-stage Roots vacuum pump GMR

    ● GMR series dry pump, can be used in cleaning process and general harsh process; ● High reliability, very low cost; ● It is mainly suitable for etching and ion implantation process cavity in semiconductor industry. <img src="https://omo-oss-image.thefastimg.com/portal-saas/new2024020415251217007/cms/image/a694d20b-eaca-43ce-abcd-46814a119b13.jpg" style="width: auto; height: auto; max-width:570px;" />

    ● GMR series dry pump, can be used in cleaning process and general harsh process;
    ● High reliability, very low cost;
    ● It is mainly suitable for etching and ion implantation process cavity in semiconductor industry.

     

    Dimensions

     

    Model

    Length (mm)

    Width (mm)

    Height (mm)

    GMR200

    695

    290

    434

    GMR600

    695

    290

    706

    GMR1200

    695

    290

    706

  • Technical parameters

     

    Model

    Maximum pumping speed
    (m3/h)

    Ultimate vacuum
    (mbar)

    Inlet diameter(ISO)

    Outlet diameter(NW)

    Supply voltage(V)

    Rated power(kw)

    Operating power
    (kw)

    Cooling water(L/m)

    Nitrogen(slm)

    Power input
    jack

    Weight
    (kg)

    Noise
    dB(A)

    GMR200

    210

    0.005

    ISO63

    NW25

    208/380

    1.9

    0.7

    1.9

    20~40

    HAN 40A

    140

    <63

    GMR600

    610

    0.005

    ISO100

    NW25

    208/380

    3.8

    1.1

    2.1

    20~90

    HAN 40A

    250

    <63

    GMR1200

    1050

    0.005

    ISO100

    NW25

    208/380

    3.8

    1.3

    2.1

    20~90

    HAN 40A

    250

    <63

     

    Pumping speed curve

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Beijing Grand Hitek Co.,Ltd

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E-mail:sales@grandhitek.com.cn

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