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GLR Series Multistage Roots Dry Vacuum Pump

GLR-P Series Multistage Roots Dry Vacuum Pump

GS Series New Integrated Claw Dry Vacuum Pump

GHC Series New Integrated Claw Dry Vacuum Pump

Semiconductor

Application Challenges and Application Areas

Process	Condensation	Corrosion	Dust	Thermal Reaction	Combustible Gas Pumping	Recommended Products
ALD	●	●	●	●	●	GHC
PECVD	●	●	●		●	GHC
LPCVD	●	●	●		●	GHC
SACVD	●		●	●	●	GHC
MOCVD	●			●	●	GHC
Metal Etch	●	●				GHC

GHC Series New Integrated Claw Dry Vacuum Pump

● GHC series dry pumps can be used in clean processes, general processes and harsh process applications. They have strong dust handling capabilities and are the first choice for harsh process applications. They have high reliability and extremely low operating cost; ● Suitable for diversified markets and widely used in semiconductor, advanced displays and other industries.

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Application Challenges and Application Areas

Process	Condensation	Corrosion	Recommended Products	Remark
IMP source	●		GMR
Strip/Ashing			GMR
Oxide Etch	●		GMR
Poly Etch		●	GMR
Metal Etch	●	●	GMR	For 6-inch and 8-inch Fab
HDP		●	GMR

GMR Series Multistage Roots Dry Vacuum Pump

● GMR series dry pumps can be used in clean processes and general demanding processes; High reliability and extremely low operating cost; ● Mainly suitable for etching and ion implantation process chambers in the semiconductor industry; ● Low energy consumption, corrosion resistance, and small footprint.

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Application Challenges and Application Areas

Process	Condensation	Recommended Products
loadlock		GLR
Transfer		GLR
PVD		GLR
Coater	●	GLR

GLR Series Multistage Roots Dry Vacuum Pump

● GLR series dry pumps can be used in clean processes and general processes, with high reliability and extremely low operating cost; ● Suitable for diversified markets, widely used in semiconductor, advanced displays, LED, lithium-ion battery and solar PV industries.

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Application Challenges and Application Areas

Process	High-flow H₂	Recommended Products
MOCVD	●	GHR
Si EPI	●	GHR
SiC EPI	●	GHR
HJT	●	GHR

GHR Series Multistage Roots Dry Vacuum Pump

● The GHR series dry pump is developed for high-flow H2 applications. It is suitable for medium and harsh process applications, such as MOCVD, silicon epitaxy, silicon carbide epitaxy and HJT. It has the characteristics of strong pumping capacity and high reliability; ● It is suitable for diversified markets and is widely used in semiconductor, LED and photovoltaic industries.

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Beijing Grand Hitek Co.,Ltd

Telephone:+86-10-86229784

E-mail:sales@grandhitek.com.cn

Headquarters address: No. 1, Kechuang 15 Jie (St) , Beijing Economic Technological Development Area

Hebei base: Building 9, Environmental Protection Industrial Park, South District, Gu'an County Industrial Zone, Langfang City

Hubei base: Attached fifth floor, Commercial Building, No. 366, Lin Konggang Avenue, Jinghe Street, Dongxihu District, Wuhan

Zhejiang base: Building 17, No. 2723, Fuchunwan Avenue, Chunjiang Street, Fuyang District, Hangzhou

Shaanxi base: Building 2, No. 46, Zhangbawu Road, Xi'an High-tech Zone

Shanghai Base: Building 9, Fuhai Business Court, Lane 299, Bisheng Road, Pudong New District, Shanghai

Minhang Base: Building 4, No. 99 Suijiang Road, Minhang District, Shanghai

Sichuan Base: Building 9, No. 665 Fujia Street, Huangjia Street, Chengdu Shuangliu Economic Development Zone, Shuangliu District, Chengdu City

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