Semiconductor

Application challenges and areas

 

Technology Condensation Corrosion Dust Thermal reaction Combustible gas pumping Recommend products
ALD Y Y Y Y Y GHC
PECVD Y Y Y   Y GHC
LPCVD Y Y Y   Y GHC
SACVD Y   Y Y Y GHC
MOCVD Y     Y Y GHC
MetalEtch Y Y       GHC

New integrated claw vacuum pump GHC

● GHC series dry pump can be used in clean process, general process and harsh process, dust handling ability is very strong, is the first choice for harsh process applications, and high reliability, very low cost. ● Suitable for diversified markets, widely used in semiconductor, panel display and other industries
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Application challenges and areas

 

Technology Condensation Corrosion Recommend products NOTES
IMPsource Y   GMR  
Strip/Ashing     GMR  
OxideEtch Y   GMR  
PolyEtch   Y GMR  
MetalEtch Y Y GMR For 6 "and 8" Feb
HDP   Y GMR  

Multi-stage Roots vacuum pump GMR

● GMR series dry pump, can be used in cleaning process and general harsh process; ● High reliability, very low cost; ● It is mainly suitable for etching and ion implantation process cavity in semiconductor industry.
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Application challenges and areas

 

Technology Condensation Recommend products
loadlock   GLR
Transfer   GLR
PVD   GLR
Coater Y GLR

Multi-stage Roots vacuum pump GLR

● GLR series dry pump, can be used in cleaning process, general process, and reliable High sex, very low cost of use ● Suitable for diversified markets, widely used in semiconductor, panel display, LED, Lithium and solar photovoltaic industries
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WeChat Public Number

Beijing Grand Hitek Co.,Ltd

Telephone:+86-10-86229784

E-mail:sales@grandhitek.com.cn

Headquarters Address: No.1 Courtyard, Kechuang 15th Street, Majuqiao Town, Tongzhou District, Beijing
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Shanghai Base: Building 9, Fuhai Business Garden, Lane 299, Bi Sheng Road, Pudong New Area, Shanghai

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