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GMR Series Multistage Roots Dry Vacuum Pump
GMR Series Multistage Roots Dry Vacuum Pump

GMR Series Multistage Roots Dry Vacuum Pump

● GMR series dry pumps can be used in clean processes and general demanding processes; High reliability and extremely low operating cost; ● Mainly suitable for etching and ion implantation process chambers in the semiconductor industry; ● Low energy consumption, corrosion resistance, and small footprint.

Detailed

● GMR series dry pumps can be used in clean processes and general demanding processes; High reliability and extremely low operating cost;

● Mainly suitable for etching and ion implantation process chambers in the semiconductor industry;

● Low energy consumption, corrosion resistance, and small footprint.

 

Application Challenges and Application Areas

Process Condensation Corrosion Recommended Products Remark
IMP source ●   GMR  
Strip/Ashing     GMR  
Oxide Etch ●   GMR  
Poly Etch   ● GMR  
Metal Etch ● ● GMR For 6-inch and 8-inch Fab
HDP   ● GMR  

 

Technical Specifications

Model Maximum Pumping Speed Ultimate Pressure Inlet Port Diameter Exhaust Port Diameter Supply Voltage Rated power Operating Power Cooling Water Nitrogen Weight Noise
（m3/h） (mbar) （ISO） （NW） （V） （kW） （kW） （L/min） （slm） （kg） dB(A)
GMR200 210 ＜1×10-2 63 25 208/380 1.9 0.7 1.9 20-40 140 ＜63
GMR600 630 ＜5×10-3 100 25 208/380 4.8 0.8 2 20-40 203 ＜63
GMR1200 1100 ＜5×10-3 100 25 208/380 4.8 1 2 20-40 203 ＜63
GMR1800 1800 ＜5×10-3 100 40 208/380 6.5 1.7 3.6 20-90 350 ＜63

 

Dimensions

Model Length（mm） Width（mm） Height（mm）
GMR200 695 290 434
GMR600 685 275 706
GMR1200 685 275 706
GMR1800 901 390 780

 

Pumping Speed Curve

WeChat Public Number

WeChat Official Account

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Beijing Grand Hitek Co.,Ltd

Telephone:+86-10-86229784

E-mail:sales@grandhitek.com.cn

Headquarters address: No. 1, Kechuang 15 Jie (St) , Beijing Economic Technological Development Area

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