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GHR Series Multistage Roots Dry Vacuum Pump
GHR Series Multistage Roots Dry Vacuum Pump

GHR Series Multistage Roots Dry Vacuum Pump

● The GHR series dry pump is developed for high-flow H2 applications. It is suitable for medium and harsh process applications, such as MOCVD, silicon epitaxy, silicon carbide epitaxy and HJT. It has the characteristics of strong pumping capacity and high reliability; ● It is suitable for diversified markets and is widely used in semiconductor, LED and photovoltaic industries.

Detailed

● The GHR series dry pump is developed for high-flow H2 applications. It is suitable for medium and harsh process applications, such as MOCVD, silicon epitaxy, silicon carbide epitaxy and HJT. It has the characteristics of strong pumping capacity and high reliability;

● It is suitable for diversified markets and is widely used in semiconductor, LED and photovoltaic industries.

 

Application Challenges and Application Areas

Process High-flow H2 Recommended Products
MOCVD ● GHR
Si EPI ● GHR
SiC EPI ● GHR
HJT ● GHR

 

Technical Specifications

Model Maximum Pumping Speed Ultimate Pressure Inlet Port Diameter Exhaust Port Diameter Supply Voltage Operating Power Cooling Water Nitrogen Weight Noise
(m3/h) (mbar) (ISO) (NW) （V） （kW） (L/min) （slm） （kg） dB(A)
GHR600 600 ＜5×10-3 50 40 380-480 4.5 8 0-60 390 ＜75
GHR700 650 ＜5×10-3 50 40 380-480 3.2 8 0-60 410 ＜75

 

Dimensions

Model Length（mm） Width（mm） Height（mm）
GHR600 1016 400 806
GHR700 1000 400 806

 

Pumping Speed Curve

WeChat Public Number

WeChat Official Account

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Beijing Grand Hitek Co.,Ltd

Telephone:+86-10-86229784

E-mail:sales@grandhitek.com.cn

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