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GHR Series Multistage Roots Dry Vacuum Pump

● The GHR series dry pump is developed for high-flow H2 applications. It is suitable for medium and harsh process applications, such as MOCVD, silicon epitaxy, silicon carbide epitaxy and HJT. It has the characteristics of strong pumping capacity and high reliability; ● It is suitable for diversified markets and is widely used in semiconductor, LED and photovoltaic industries.
  • Detailed description
  • Specifications
    • Commodity name: GHR Series Multistage Roots Dry Vacuum Pump

    ● The GHR series dry pump is developed for high-flow H2 applications. It is suitable for medium and harsh process applications, such as MOCVD, silicon epitaxy, silicon carbide epitaxy and HJT. It has the characteristics of strong pumping capacity and high reliability; ● It is suitable for diversified markets and is widely used in semiconductor, LED and photovoltaic industries.

    ● The GHR series dry pump is developed for high-flow H2 applications. It is suitable for medium and harsh process applications, such as MOCVD, silicon epitaxy, silicon carbide epitaxy and HJT. It has the characteristics of strong pumping capacity and high reliability;
    ● It is suitable for diversified markets and is widely used in semiconductor, LED and photovoltaic industries.

     

    Application Challenges and Application Areas

    Process High-flow H2 Recommended Products
    MOCVD ● GHR
    Si EPI ● GHR
    SiC EPI ● GHR
    HJT ● GHR

  •  

    Technical Specifications

    Model Maximum Pumping Speed Ultimate Pressure Inlet Port Diameter Exhaust Port Diameter Supply Voltage Operating Power Cooling Water Nitrogen Weight Noise
    (m3/h) (mbar) (ISO) (NW) （V） （kW） (L/min) （slm） （kg） dB(A)
    GHR600 600 ＜5×10-3 50 40 380-480 4.5 8 0-60 390 ＜75
    GHR700 650 ＜5×10-3 50 40 380-480 3.2 8 0-60 410 ＜75

     

    Dimensions

    Model Length（mm） Width（mm） Height（mm）
    GHR600 1016 400 806
    GHR700 1000 400 806

     

    Pumping Speed Curve

      

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Beijing Grand Hitek Co.,Ltd

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