Merak Dual-Deck Multi-Pump Integrated Vacuum System

● Merak is a dual-deck multi-pump integrated module with a modular design that can flexibly integrate various types of vacuum pumps, chillers and other equipment. It supports adding or removing modules on demand, greatly simplifying the space of the wafer factory and increasing the output per unit area; ● It is suitable for various processes such as semiconductor Etch and PVD, significantly reducing Hookup costs and Facility point requirements, greatly shortening installation time, and helping wafer factories simplify design, rapid deployment, and safe operations.

Phecda Integrated Single-Pump Vacuum System

● Phecda is an integrated single-pump integrated module for Diffusion, EPI, MOCVD and other processes, including dry vacuum pumps and exhaust gas abatement system; ● It has the advantages of safety, reliability, stable operation, predictive maintenance, and smaller footprint.

Megrez Integrated Plasma Vacuum System

● Megrez is a plasma integrated machine developed by Grand Hitek for WN and some heavy SiO2 dust processes (HARP, PE-TEOS, etc.); ● Integrating the plasma generator and vacuum pump into one system can safely and efficiently extend the service life of dry pumps in related processes.

Alioth Integrated Multi-Pump Vacuum System

● Alioth is an integrated multi-pump integrated module (vacuum pump + exhaust gas abatement system), specially designed to improve process safety and equipment operation stability; ● It can significantly reduce TCO (total cost of ownership), Hookup costs and Facility point requirements, significantly save floor space and shorten installation time.

Mizar Integrated Vacuum System

● Mizar pump group is an integrated stacked pump system. The system adopts a mechanical booster pump-mechanical booster pump-dry pump structure. It can be used in clean processes, general processes and harsh process applications, and has high reliability and low operating cost.

GHC Series New Integrated Claw Dry Vacuum Pump

● GHC series dry pumps can be used in clean processes, general processes and harsh process applications. They have strong dust handling capabilities and are the first choice for harsh process applications. They have high reliability and extremely low operating cost; ● Suitable for diversified markets and widely used in semiconductor, advanced displays and other industries.

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Beijing Grand Hitek Co.,Ltd

Telephone:+86-10-86229784

E-mail:sales@grandhitek.com.cn

Headquarters address: No. 1, Kechuang 15 Jie (St) , Beijing Economic Technological Development Area

Hebei base: Building 9, Environmental Protection Industrial Park, South District, Gu'an County Industrial Zone, Langfang City

Hubei base: Attached fifth floor, Commercial Building, No. 366, Lin Konggang Avenue, Jinghe Street, Dongxihu District, Wuhan

Zhejiang base: Building 17, No. 2723, Fuchunwan Avenue, Chunjiang Street, Fuyang District, Hangzhou

Shaanxi base: Building 2, No. 46, Zhangbawu Road, Xi'an High-tech Zone

Shanghai Base: Building 9, Fuhai Business Court, Lane 299, Bisheng Road, Pudong New District, Shanghai

Minhang Base: Building 4, No. 99 Suijiang Road, Minhang District, Shanghai

Sichuan Base: Building 9, No. 665 Fujia Street, Huangjia Street, Chengdu Shuangliu Economic Development Zone, Shuangliu District, Chengdu City

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